The Transformation of Di- and Tri-chloromethane Induced By Low Voltage Discharge


This article is focused on the transformation of di- and trichloromethane by induced low-voltage discharges in the liquid phase. To generate discharges, a direct current source is used (capacitance 2200 μF, voltage 60 V). The products and probable intermediates of the CH2Cl2 and CHCl3 transformation were determined by the methods of thermodynamic modeling, FTIR spectroscopy and electron microscopy. Under the action of low-voltage discharges on the liquid substrates, needle fullerene- like structures are formed. In this case the gas phase consists mainly of hydrogen chloride. From the simulation of the nonequilibrium composition of particles and molecular systems it follows that in the course of induced reactions of CH2Cl2 and CHCl3 and geminal elimination of HCl molecules, predominantly carbene-type intermediates are generated.

Keywords: dichloromethane, trichloromethane, low temperature plasma, discharges in the liquid phase

[1] Bodrikov, I. V., et al. (2018). Fragmentation of thiophene and 3-methyl-2-thiophenecarboxaldehyde by direct liquid phase low voltage discharges. Plasma Processes and Polymers, vol. 15, pp. 1-6.

[2] Titov, E. Y., Bodrikov, I. V. and Kut’in, A. M. (2019, March). Plasma-Chemical Simulation Fragmentation of Chloroform in the Liquid Phase by Direct Electrical Discharges. Presented at 5th International Conference on Industrial Engineering, Sochi, Russian Federation. Sochi: Solid State Phenomena.

[3] Titov, E. Y., et al. (2018). A Device for Generation of Low Voltage Discharges in Liquid Dielectric Media. High Energy Chemistry, vol. 52, pp. 512–513.

[4] Boenig, H. V. (1988). Fundamentals of plasma chemistry and technology. Boston: Technomic Publ. Co. Cop.

[5] Voronin, G. H. (1987). Fundamentals of Thermodynamics. Moscow: Moscow State University Publishing House.

[6] An, Q. C., et al. (2014). CCl Radicals As a Carbon Source for Diamond Thin Film Deposition. The Journal of Physical Chemistry Letters, vol. 5, pp. 481-484.