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Kryukova, I., Dovzhenko, D., Chistyakov, A., & Nabiev, I. (2018). Preparation of Freestanding Porous Silicon Photonic Crystals. KnE Energy, 3(3), 90–95. https://doi.org/10.18502/ken.v3i3.2017

https://doi.org/10.18502/ken.v3i3.2017

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authors

  • I Kryukova
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  • D Dovzhenko
    No author data available.
  • A Chistyakov
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  • I Nabiev
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Published Date

  • Apr 25, 2018

Preparation of Freestanding Porous Silicon Photonic Crystals

KnE Energy / VII International Conference on Photonics and Information Optics (PhIO) / Pages 90–95

Abstract

Nowadays, the photonic crystals are of great interest and are widely used in photonics, biosensing, optoelectronics and other fields of research. The one-dimensional photonic crystals manufactured on the basis of porous silicon were proved to be the most suitable for applications due to their high sorption ability, large surface area, easiness of fabrication, and possibility to precisely control porosity and refractive index during electrochemical etching. However, the sensitivity of various kinds of gas and biological sensors as well as the performance of solar cells and other devices on the basis of porous silicon structures may be significantly increased by detaching the structures from the substrate. Here, we have developed and investigated the fabrication procedure of freestanding one-dimensional photonic crystals on the basis of porous silicon with the use of electropolishing method followed stabilization of freestanding porous silicon photonic structures through their oxidation. We have demonstrated that the developed and applied lift-off procedure does not violate the morphology and the photonic properties of the samples.


Keywords: Porous silicon, photonic crystals, microcavity, thin films, freestanding photonic crystals.

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